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[148] Defect Mapping and Densification in Self-Assembled Monolayers of Octadecyltrichlorosilane on SiO2Yasuharu Miyamoto; Yukifumi Yoshida; Toru Utsunomiya; Shogo Kunieda; Yusuke Ueda; Masakazu Sanada; Hiroyuki Sugimura
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[137] Atomic-Scale Structural Analysis on the Interfaces between Molten Gallium and Solid Alloys by Atomic Force MicroscopyTakashi Ichii; Makoto Murata; Toru Utsunomiya; Hiroyuki Sugimura
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[120] Superelastic Multifunctional Aminosilane-Crosslinked Graphene Aerogels for High Thermal Insulation, Three-Component Separation, and Strain/Pressure-Sensing ArraysGuoqing Zu; Kazuyoshi Kanamori; Kazuki Nakanishi; Xuanming Lu; Kunhua Yu; Jia Huang; Hiroyuki Sugimura
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28, 20, 7579 - 7584, 2012DOI:
10.1021/la301042y
[68] Self-alignment of gold nanoparticles through the control of particle-substrate and particle-particle interactionsH. Sugimura; J. Yang; S. Uchida; T. Higashino; O. P. Khatri; T. Ichii; K. Murase
Procedia Engineering,
36, 374 - 381, 2012DOI:
10.1016/j.proeng.2012.03.055
[67] Nanotemplate Prepared by means of Vacuum Ultra-Violet Patterning of Alkylsilane Self-Assembled Monolayer on ITO Using a Porous Alumina Mask: Application to the Fabrication of Gold Nanoparticle ArraysJ. Yang; T. Ichii; K. Murase; H. Sugimura; T. Kondo; H. Masuda
Chem. Lett.,
41, 392 - 393, 2012DOI:
10.1246/cl.2012.392
[66] 玉野製錬所ニカワ連続溶解設備導入による ニカワ・電力原単位削減
下川公博; 川口賢一; 西田幸司; 邑瀬邦明; 杉村博之; 粟倉泰弘
Journal of MMIJ, 128, 155 - 159, 2012
[65] Circular Arrays of Gold Nanoparticles of a Single Particle Line Thickness Formed on Indium Tin OxideJ. Yang; T. Ichii; K. Murase; H. Sugimura
Appl. Phys. Exp.,
5, 025202, 1 - 3, 2012DOI:
10.1143/APEX.5.025202
2011
[64] Electrochemical Polishing of Metallic Titanium in Ionic Liquid
T. Uda; K. Tsuchimoto; H. Nakagawa; K. Murase; Y. Nose; Y. Awakura
Materials Transactions, 52, 2061 - 2066, 2011
[63] Thermodynamics of Cathodic ZnTe Electrodeposition Using Basic Ammoniacal Electrolytes: Why CdTe Can Deposit While ZnTe Cannot
K. Murase; T. Suzuki; Y. Umenaka; T. Hirato; Y. Awakura
High Temperature Materials and Processes, 30, 451 - 458, 2011
[62] Revaluation of equilibrium quotient between titanium ions and metallic titaniumin NaCl–KCl equimolar molten salt
H. Sekimoto; Y. Nose; T. Uda; A. Uehara; H. Yamana; H. Sugimura
Journal of Alloys and Compounds, 509, 5477 - 5482, 2011
[61] Molecular packing density of self-assembled monolayer formed from N-(2-aminoethyl)-3-aminopropyltriethoxysilane by a vapor phase process
H. Sugimura; T. Moriguchi; M. Kanda; Y. Sonobayashi; H. M. Nishimura; T. Ichii; K. Murase; S. Kazama
Chemical Communication, 47, 8841 - 8843, 2011
[60] Self-Aligned Nucleation of Gold onto Templates with a Nano-scale Precision Fabricated by Scanning Probe Lithography
H. Sugimura; M. Kanda; T. Ichii; K. Murase
J. Photochem. Photobio. A, 221, 209 - 213, 2011
[59] Formation of Uniform Ferrocenyl-terminated Monolayer Covalently Bonded to Si Using Reaction of Hydrogen-Terminated Si(111) Surface with Vinylferrocene/n-Decane Solution by Visible-Light Excitation
H. Sano; M. Zhao; D. Kasahara; K. Murase; T. Ichii; H. Sugimura
J. Colloid Interf. Sci., 361, 259 - 269, 2011
[58] Preparation of Cu-Sn Layers on Polymer Substrate by Reduction-Diffusion Method Using Ionic Liquid Baths
K. Murase ; A. Ito; T. Ichii; H. Sugimura
J. Electrochem. Soc., 158, 6, D335 - D341, 2011
2010
[57] Resin Elongation Phenomenon of Polystyrene Nanopillars in Nanoimprint Lithography
K. Kuwabara; A. Miyauchi; H. Sugimura
Jpn. J. Appl. Phys., 49, 106505, 2010
[56] 銅電解精製におけるワックスレスパーマンネントカソードプロセスのラミネーション界面
下川公博; 成田誠; 隅田育伸; 邑瀬邦明; 杉村博之; 粟倉泰弘
Jounal of MMIJ, 126, 12, 697 - 700, 2010
[55] Quantitative Analysis of Titanimu Ions in the Equilibrium with Metallic Titanium in NaCl-KCl Equimolar Moten Salt
H. Sekimoto; Y. Nose; T. Uda; H. Sugimura
Mater. Trans., 51, 2121 - 2124, 2010
[54] Degradation behavior of release layers for nanoimprint lithography formed on atomically flat Si(111) terraces
K. Kuwabara; A. Miyauchi; H. Sugimura
J. Vac. Sci. Technol. B, 24, 5, 968 - 972, 2010
[53] Anionic effect of ionic liquids electrolyte on electrochemical behavior of ferrocenylthiol/alkanethiol binary SAMs
Q.-W. Sun; K. Murase; T. Ichii; H. Sugimura
J. Electroanal. Chem., 643, 58 - 66, 2010
[52] Alkanethiol Self-Assembled Monolayers Formed on Silicon Substrates
H. Sano; K. Ohno; T.i Ichii; K. Murase; H. Sugimura
Jpn. J. Appl. Phys., 49, 01AE09, 1 - 5, 2010
2009
[51] Organosilane Self-Assembled Multilayer Formation Based on Activation of Methyl-Terminated Surface with Reactive Oxygen Species Generated by Vacuum Ultra-Violet Excitation of Atmospheric Oxygen Molecules
Y.-J. Kim; J. HanN; H. Sano; K.-H. Lee; K. Noda; T. Ichii; K. Murase; K. Matsushige; H. Sugimura
Appl. Surf. Sci., 256, 1507 - 1513, 2009
[50] Probing the diffusion of vacuum ultraviolet (λ = 172 nm) induced oxidants by nanoparticles immobilization
Om P. Khatri; T. Hatanaka; K. Murase; H. Sugimura
Appl. Surf. Sci., 255, 9817 - 9821, 2009
[49] Reversible Potential Change of Ferrocenylthiol Monolayers Induced by Atomic Force MicroscopyTakashi Ichii; Shin-ichiro Nanjo; Kuniaki Murase; Hiroyuki Sugimura
Jpn. J. Appl. Phys.,
48, 08JB15-1 - 08JB15-4, 2009DOI:
10.1143/JJAP.48.08JB15
[48] Sustainable Electrodeposition of ZnO by a Galvanic Contact Method
T. Shinagawa; K. Murase; M. Izakid
Electrochem. Solid-State Lett., 12, 9, D72 - D75, 2009
[47] Cu-Sn Alloy Metallization of Polymer Substrate through Reduction-Diffusion Method Using Ionic Liquid Bath at Medium-Low Temperatures
A. Ito; K. Murase; T. Ichii; H. Sugimura
Electrochemistry, 77, 8, 677 - 679, 2009
[46] Gold nanoparticle arrays fabricated on a silicon substrate covered with a covalently bonded alkyl monolayer by electroless plating combined with scanning probe anodization lithography
H. Sugimura; S. Nanjo; H. Sano; K. Murase
J. Phys. Chem. C., 113, 27, 11643 - 11646, 2009
[45] Effects of Counteranions and Dissolved Oxygen on Chemical ZnO Deposition from Aqueous Solutions
T. Shinagawa; K. Murase; S. Otomo; J. Katayama; M. Izakid
J. ELectrochem. Soc., 146, 5, H320 - H326, 2009
[44] Alkyl and Alkoxyl Monolayers Directly Attached to Silicon: Chemical Durability in Aqueous Solutions
H. Sano; H. Maeda; T. Ichii; K. Murase; K. Noda; K. Matsushige; H. Sugimura
Langmuir, 25, 10, 5516 - 5525, 2009
[43] Scanning Probe Anodization Patterning of Si Substrates Covered with a Self-Assembled Monolayer Dependent on Surface Hydrophilicity
J. Han; D. Kasahara; T. Ichii; K. Murase; H. Sugimura
J. Vac. Sci. Technol. B, 27, 2, 928 - 933, 2009
[42] Soft Processing for Formation of SAM on Hydrogen-Terminated Silicon Surface Based on Visible-Light Excitation
H. Sano; T. Yaku; T. Ichii; K. Murase
J. Vac. Sci. Technol. B, 27, 2, 858 - 862, 2009
[41] Room-Temperature Size Evolution of Thiol-Protected Gold Nanoparticles Assisted by Proton Acids and Halogen Anions
M. Kanehara; J. Sakurai; H. Sugimura; T. Teranishi
J. Am. Chem. Soc., 131, 5, 1630, 2009
[40] Vacuum ultraviolet-induced surface modification of cyclo-olefin polymer substrates for photochemical activation bonding
Y.-. Kim; Y. Taniguchi; K. Murase; Y. Taguchi; H. Sugimura
Appl. Surf. Sci., 255, 6, 3648 - 3654, 2009
2008
[39] Tribological Properties of Self-assembled Monolayers Covalently Bonded to Si
M. Nakano; T. Ishida; H. Sano; H. Sugimura; K. Miyake; Y. Ando; S. Sasaki
Applied Surface Science, 255, 3040 - 3045, 2008
[38] Wettability control of photocatalytic crystal layers by hydrophobic coating and subsequent UV light irradiation
K. Teshima; S. Suzuki; K. Yubuta; Y. Sonobayashi; T.i Suzuki; T. Shishido; H.i Sugimura; S.i Oishi
Surface & Coatings Technology, 203, 812 - 815, 2008
[37] Self-Assembly Guided One-Dimensional Arrangement of Gold Nanoparticles: A Facile Approach
O. P. Khatri; J. Han; T. Ichii; K. Murase; H. Sugimura
J. Phys. Chem. C., 112, 42, 16182 - 16185, 2008
[36] Regulation of Pattern Dimension as a Function of Vacuum Pressure: Alkyl Monolayer Lithography
O. P. Khatri; H. Sano; K. Murase; H. Sugimura
Langmuir, 24, 20, 12077 - 12084, 2008
[35] Highly Crystalline Chlorapatite Films Prepared by the Evaporation of a Sodium Chloride Flux
K. Teshima; M. Sakurai; K. Yubuta; Y. Sonobayashi; Y. Suzuki; T. Shishido; H. Sugimura; S. Oishi
Cryst. Growth Des., 8, 8, 2595 - 2597, 2008
[34] Self-Assembly of Ionic Liquid (BMI-PF6)-Stabilized Gold Nanoparticles on a Silicon Surface: Chemical and Structural Aspects
O. P. Khatri; K. Adachi; K. Murase; K. Okazaki; T. Torimoto; N. Tanaka; S. Kuwabata; H. Sugimura
Langmuir, 24, 7785 - 7792, 2008
[33] Self-Assembled Monolayers Directly Attached to Silicon Substrates Formed from 1-Hexadecene by Thermal, Ultraviolet, and Visible Light Activation Methods
H. Sano; H. Maeda; S. Matsuoka; K.-H. Lee; K. Murase; H. Sugimura
Jpn. J. Appl. Phys., 47, 5659 - 5664, 2008
[32] Spatially Controlled Functionalization and Chemical Manipulation to Fabricate 2D Arrays of Gold Nanoparticles onto Indium Tin Oxide
O. P. Khatri; K. Murase; H. Sugimura
Jpn. J. Appl. Phys., 47, 5048 - 5052, 2008
[31] Alternate stacking of transition metal ions and terephthalic acid molecules for the fabrication of self-assembled multilayers
H. Sugimura; H. Yonezawa; S. Asai; Q.-W. Sun; T. Ichii; K.-H. Lee; K. Murase; K. Noda; K. Matsushige
Colloids and Surfaces A: Physicochemical and Engineering Aspects, 321, 249 - 253, 2008
[30] Ruthenium－amine complexation for constructing self-assembled molecular films
T. Moriguchi; K. Murase; H. Sugimura
Colloids and Surfaces A: Physicochemical and Engineering Aspects, 321, 94 - 98, 2008
[29] Structural Organization of Gold Nanoparticles onto the ITO Surface and Its Optical Properties as a Function of Ensemble Size
O. P. Khatri; K. Murase; H. Sugimura
Langmuir, 24, 3787 - 3793, 2008
[28] Surface Chemical Conversion of Organosilane Self-Assembled Monolayers with Active Oxygen Species Generated by Vacuum Ultraviolet Irradiation of Atmospheric Oxygen Molecules
Y.-J. Kim; K.-H. Lee; H. Sano; J. Han; T. Ichii; K. Murase; Hiroyuki Sugimura
Jpn. J. Appl. Phys., 47, 307 - 312, 2008
2007
[27] Patterning of Self-assembled Thin Films Using Vacuum Ultraviolet Irradiation Through Anodic Porous Alumina Mask
M. Harada; S. Murata; T. Yanagishita; H. Sugimura; K.i Nishio; H. Masuda
Chem. Lett., 36, 1266 - 1267, 2007
[26] Electrochemical Alloying of Cupper Substrate with Tin Using Ionic Liquid as an Electrolyte at Medium-Low Temperatures
K. Murase; R. Kurosaki; T. Katase; H. Sugimura; T. Hirato; Y. Awakura
J. Electrochem. Soc., 154, D612 - D616, 2007
[25] Scanning capacitance microscopy for alkylsilane monolayer covered-Si substrate patterned by scanning probe lithography
J. Han; K.-H. Lee; S. Fujii; H. Sano; Y.-J. Kim; K. Murase; T. Ichii; H. Sugimura
Jpn. J. Appl. Phys., 146, 5621 - 5625, 2007
[24] Multicycle Desorption-adsorption Voltammetry for Self-assembled Mixed Monolayer Containing Ferrocenylthiol Molecules: A Discussion on Molecular Interaction in the Mixed Layer
S. Fujii; K. Murase; H. Sugimura
Electrochemistry, 75, 523 - 527, 2007
[23] Self-assembled mixed monolayer containing ferrocenylthiol molecules: STM observations and electrochemical investigations
S. Fujii; S. Kurokawa; K. Murase; K.-H. Lee; A. Sakai; H. Sugimura
Electrochim. Acta, 52, 4436 - 4442, 2007
[22] Thermal Immobilization of Ferrocene Derivatives on (111) Surface of n-Type Silicon - Parallel between Vinylferrocene and Ferrocenecarboxaldehyde
N. Tajimi; H. Sano; K. Murase; K.-H. Lee; H.i Sugimura
Langmuir, 23, 3193 - 3198, 2007
2006
[21] Self-Assembled Multilayer Formed by Alternate Stacking of Zirconium and Telephtalic Acid Layers
Hiroyuki Yonezawa; Kyung-Hwang Lee; Kuniaki Murase; Hiroyuki Sugimura
Chem Lett., 35, 12, 1392 - 1393, 2006
[20] Organic Monolayers Covalently Bonded to Si as Ultra Thin Photoresist Films in Vacuum Ultra-Violet Lithography
H. Sugimura; H. Sano; K.-H. Lee; K. Murase
Jpn. J. Appl. Phys., 45, 5456 - 5460, 2006
[19] Micropatterning of self-assembled monolayers on silicon amplified with photochemically generated atomic oxygen
H. Sugimura; K.-H. Lee; H. Sano; R. Toyokawa
Colloids and Surfaces A: Physicochemical and Engineering Aspects, 284-285, 561 - 566, 2006
2005
[18] Photolithographic Patterning of Dendrimer Monolayers and Pattern-Selective Adsorption of Linear Macromolecules
T.Yamazaki; T. Imae; H. Sugimura; N. Saito; K. Hayashi; O. Takai
Journal of Nanoscience and Nanotechnology, 5, 1792 - 1800, 2005
[17] Nanoscopic surface architecture based on molecular self-assembly and scanning probe lithography
H. Sugimura
International Journal of Nanotechnology, 2, 314 - 347, 2005
[16] 二段階プラズマプロセスによる超はっ水高分子基板の作製
手嶋勝弥; 高野敦; 赤田正典; 井上泰志; 杉村博之; 高井治
表面技術, 56, 524 - 527, 2005
[15] Ultrahydrophobic/Ultrahydrophilic Micropatterning on a Polymeric Substrate
K. Teshima; H. Sugimura; A. Takano; Y. Inoue; O. Takai
Chem. Vap. Dep., 11, 347 - 349, 2005
[14] Micropatterning of chloromethylphenylsiloxane self-assembled monolayer photochemically amprified with atmospheric oxygen
H. Sugimura; L. Hong; K.-H. Lee
Jpn. J. Appl. Phys., 44, 5185 - 5187, 2005
[13] Surface-Potential Reversibility of an Amino-Terminated Self-Assembled Monolayer Based on Nanoprobe Chemistry
N. Saito; S.-H. Lee; I. Takahiro; J. Hieda; H. Sugimura; O. Takai
J. Phys. Chem. B, 109, 11602 - 11605, 2005
[12] Transparent Ultra Water-Repellent Poly(ethylene terephthalate) Substrates Fabricated by Oxygen Plasma Treatment and Subsequent Hydrophobic Coating
K. Teshima; H. Sugimura; O. Takai; A. Takano
Appl. Surf. Sci., 244, 619 - 622, 2005
2004
[11] Wettability of Poly(ethylene terephthalate) Substrates Modified by a Two-Step Plasma Process: Ultra Water-Repellent Surface Fabrication
K. Teshima; H. Sugimura; Y. Inoue; O. Takai; A. Takano
Chem. Vap. Dep., 10, 295 - 297, 2004
[10] Reversible nanochemical conversion
H. Sugimura; N. Saito; S.-H. Lee; O. Takai
J. Vac. Sci. Technol. B, 22, L44 - 46, 2004
[9] Organosilane self-assembled monolayers directly linked to the diamond surfaces
R. Ohta; N. Saito; Y. Inoue; H. Sugimura; O. Takai
J. Vac. Sci. Technol. A, 22, 2005 - 2009, 2004
[8] Micropatterned Carbohydrate Displays by Self-Assembly of Glycocojugate Polymers on Hydrophobic Templated on Silicon
Y. Miura; H. Sato; T. Ikeda; H. Sugimura; O. Takai; K. Kobayashi
Biomacromolecules, 5, 1708 - 1713, 2004
[7] Scanning Probe-Based Chemical Conversion of Organic Monolayers
H. Sugimura
Jpn. J. Appl. Phys., 43, 4477 - 4481, 2004
[6] Photochemical Reaction of Organosilane Self-Assembled Monolayer as Studied by Scanning Probe Microscopy
H. Sugimura; N. Saito; Y. Ishida; I. Ikeda; K. Hayashi; O. Takai
J. Vac. Sci. Technol. A, 22, 1428 - 1432, 2004
[5] Exploration of the Chemical Bonding Forms of Alkoxy-Type Organic Monolayers Directly Attached to Silicon
N. Saito; S.-H. Lee; N. Maeda; R. Ohta; H. Sugimura; O. Takai
J. Vac. Sci. Technol. A, 22, 1425 - 1427, 2004
[4] Generation of Amino-Terminated Surfaces by Chemical Lithography Using Atomic Force Microscopy
N. Saito; N. Maeda; H. Sugimura; O. Takai
Langmuir, 20, 5182 - 5184, 2004
[3] Photodegradation Micropatterning of Adsorbed Collagen using Vacuum Ultraviolet Light
Y. Ito; M. Nogawa; H. Sugimura; O. Takai
Langmuir, 20, 4299 - 4301, 2004
[2] Thermal Characterization of Amino-Terminated Self-Assembled Monolayers
A. Shida; H. Sugimura; A. Hozumi; Y. Sawada; O. Takai
Trans. Mater. Res. Soc. Japan, 29, 343 - 346, 2004
[1] Surface Potential Microscopy for Chemistry of Organic Self-Assembled Monolayers in Small Domains
H. Sugimura; N. Saito; N. Maeda; I. Ikeda; Y. Ishida; K. Hayashi; L. Hong; O. Takai
Nanotechnology, 15, S69 - S75, 2004
